Please use this identifier to cite or link to this item:
For citation please use:
Main Title: Regimes of adhesive wear in dry contact: Conditions of realization and determining parameters
Author(s): Dudkin, Ivan V.
Shilko, Evgeny V.
Popov, Valentin L.
Dimaki, Andrey V.
Type: Article
Language Code: en
Abstract: The paper reviews tangential adhesive contact of single asperities of elastic-plastic body surfaces. With the help of discrete element method we carried out a parametric study of influence of the parameters of adhesive interaction of the surfaces on the regime of asperity wear. It was established that with the adhesion work increase, the wear regime evolves from the mutual slippage of asperities to their attrition or brittle fracture, therewith the regime change has threshold nature. We obtained an empirical sigmoidal dependence of the threshold value of adhesion strength separating the slippage and attrition regimes on the strain-hardening coefficient of the material The results of the research make an important contribution to understanding the mechanisms that determine the development and intensity of wear in dry contact with adhesion.
Issue Date: 2019
Date Available: 19-May-2020
DDC Class: 530 Physik
Subject(s): materials degradation
discrete element method
adhesive contact
Journal Title: AIP Conference Proceedings
Publisher: American Institute of Physics (AIP)
Publisher Place: Melville, NY
Volume: 2167
Issue: 1
Article Number: 20075
Publisher DOI: 10.1063/1.5131942
EISSN: 1551-7616
ISSN: 0094-243X
Notes: This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in AIP Conference Proceedings 2167, 020075 (2019) and may be found at
Appears in Collections:FG Systemdynamik und Reibungsphysik » Publications

Files in This Item:
dudkin_etal_2019.pdf   Until 2020-11-20

Format: Adobe PDF | Size: 436.51 kB

Item Export Bar

Items in DepositOnce are protected by copyright, with all rights reserved, unless otherwise indicated.