Please use this identifier to cite or link to this item: http://dx.doi.org/10.14279/depositonce-10079
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Main Title: Achieving diffraction-limited resolution in soft-X-ray Fourier-transform holography
Author(s): Geilhufe, Jan
Pfau, Bastian
Günther, Christian M.
Schneider, Michael
Eisebitt, Stefan
Type: Article
Language Code: en
Abstract: The spatial resolution of microscopic images acquired via X-ray Fourier-transform holography is limited by the source size of the reference wave and by the numerical aperture of the detector. We analyze the interplay between both influences and show how they are matched in practice. We further identify, how high spatial frequencies translate to imaging artifacts in holographic reconstructions where mainly the reference beam limits the spatial resolution. As a solution, three methods are introduced based on numerical post-processing of the reconstruction. The methods comprise apodization of the hologram, refocusing via wave propagation, and deconvolution using the transfer function of the imaging system. In particular for the latter two, we demonstrate that image details smaller than the source size of the reference beam can be recovered up to the diffraction limit of the hologram. Our findings motivate the intentional application of a large reference-wave source enhancing the image contrast in applications with low photon numbers such as single-shot experiments at free-electron lasers or imaging at laboratory sources.
URI: https://depositonce.tu-berlin.de/handle/11303/11188
http://dx.doi.org/10.14279/depositonce-10079
Issue Date: 2020
Date Available: 20-May-2020
DDC Class: 530 Physik
Subject(s): X-ray imaging
holography
resolution
Sponsor/Funder: BMBF, 05K10KTB, Verbundprojekt: FSP 301 - FLASH: Nanoskopische Systeme. Teilprojekt 1.1: Universelle Experimentierkammer für Streuexperimente mit kohärenten Femtosekunden-Röntgenpulsen Multi Purpose Coherent Scattering Chamber for FLASH and XFEL 'MPscatt'
License: https://creativecommons.org/licenses/by-nc-nd/4.0/
Journal Title: Ultramicroscopy
Publisher: Elsevier
Publisher Place: Amsterdam [u.a.]
Volume: 214
Article Number: 113005
Publisher DOI: 10.1016/j.ultramic.2020.113005
EISSN: 1879-2723
ISSN: 0304-3991
Appears in Collections:FG Röntgenoptik und Nanometer-Optik » Publications

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