Please use this identifier to cite or link to this item: http://dx.doi.org/10.14279/depositonce-10081
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Main Title: Mechanical Design of the MID Split-and-Delay Line at the European XFEL
Author(s): Friedrich, B.
Noll, Tino
Lu, Wei
Roth, T.
Madsen, Anders
Eisebitt, Stefan
Type: Conference Object
Language Code: en
Abstract: A new split-and-delay line (SDL) is under development for the Materials Imaging and Dynamics (MID) end station at the European XFEL.* The device utilises Bragg reflection to provide pairs of X-ray pulses with an energy of (5 - 10) keV and a continuously tunable time delay of (-10 - 800) ps - thus allowing zero-crossing of the time delay. The mechanical concept features separate positioning stages for each optical element. Those are based on a serial combination of coarse motion axes and a fine alignment 6 DoF Cartesian parallel kinematics**. That allows to meet the contradictory demands of a fast long-range travel of up to 1000 mm and in the same time a precise alignment with a resolution in the nanometer range. Multiple laser interferometers monitor the position of the optical elements and allow an active control of their alignment. All optical elements and mechanics will be installed inside an UHV chamber, including the interferometer and about 100 stepper motors. With this paper we present the mechanical design for the SDL. It will additionally show the design of a prototype of a positioning stage which allows extensive testing of the implemented concepts and techniques.
URI: https://depositonce.tu-berlin.de/handle/11303/11190
http://dx.doi.org/10.14279/depositonce-10081
Issue Date: 2016
Date Available: 22-May-2020
DDC Class: 530 Physik
Subject(s): ion
FEL
controls
alignment, laser
split-and-delay line
SDL
MID
Materials Imaging and Dynamics
XFEL
X-ray
mechanical design
License: https://creativecommons.org/licenses/by/3.0/
Proceedings Title: Proceedings of MEDSI2016, Barcelona, Spain
Publisher: JACoW
Publisher Place: Geneva
Publisher DOI: 10.18429/JACoW-MEDSI2016-MOPE22
Page Start: 50
Page End: 53
ISBN: 978-3-95450-188-5
Appears in Collections:FG Röntgenoptik und Nanometer-Optik » Publications

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