Please use this identifier to cite or link to this item: http://dx.doi.org/10.14279/depositonce-6392
Main Title: Sharp-interface formation during lithium intercalation into silicon
Author(s): Meca, Esteban
Münch, Andreas
Wagner, Barbara
Type: Article
Language Code: en
Abstract: In this study, we present a phase-field model that describes the process of intercalation of Li ions into a layer of an amorphous solid such as amorphous silicon (a-Si). The governing equations couple a viscous Cahn–Hilliard-Reaction model with elasticity in the framework of the Cahn–Larché system. We discuss the parameter settings and flux conditions at the free boundary that lead to the formation of phase boundaries having a sharp gradient in lithium ion concentration between the initial state of the solid layer and the intercalated region. We carry out a matched asymptotic analysis to derive the corresponding sharp-interface model that also takes into account the dynamics of triple points where the sharp interface intersects the free boundary of the Si layer. We numerically compare the interface motion predicted by the sharp-interface model with the long-time dynamics of the phase-field model.
URI: https://depositonce.tu-berlin.de//handle/11303/7083
http://dx.doi.org/10.14279/depositonce-6392
Issue Date: 2017
Date Available: 27-Oct-2017
DDC Class: 510 Mathematik
Subject(s): asymptotic analysis
phase-field model
stability analysis
interface dynamics
numerical methods
Usage rights: Terms of German Copyright Law
Journal Title: European journal of applied mathematics
Publisher: Cambridge University Press
Publisher Place: Cambridge
Publisher DOI: 10.1017/s0956792517000067
Page Start: 1
Page End: 28
EISSN: 1469-4425
ISSN: 0956-7925
Notes: Dieser Beitrag ist mit Zustimmung des Rechteinhabers aufgrund einer (DFG geförderten) Allianz- bzw. Nationallizenz frei zugänglich.
This publication is with permission of the rights owner freely accessible due to an Alliance licence and a national licence (funded by the DFG, German Research Foundation) respectively.
Appears in Collections:Institut für Mathematik » Publications

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