Please use this identifier to cite or link to this item: http://dx.doi.org/10.14279/depositonce-8727
Main Title: Volume Hologram Formation in SU-8 Photoresist
Author(s): Sabel, Tina
Type: Article
Language Code: en
Abstract: In order to further understand the mechanism of volume hologram formation in photosensitive polymers, light-induced material response is analyzed in commonly used epoxy-based negative photoresist Epon SU-8. For this purpose, time-resolved investigation of volume holographic grating growth is performed in the SU-8 based host–guest system and in the pure SU-8 material, respectively. The comparison of grating growth curves from doped and undoped system allows us to draw conclusions on the impact of individual components on the grating formation process. The successive formation of transient absorption as well as phase gratings in SU-8 is observed. Influence of exposure duration and UV flood cure on the grating growth are investigated. Observed volume holographic grating formation in SU-8 can be explained based on the generation and subsequent diffusion of photoacid as well as time-delayed polymerization of exposed and unexposed areas.
URI: https://depositonce.tu-berlin.de/handle/11303/9687
http://dx.doi.org/10.14279/depositonce-8727
Issue Date: 30-May-2017
Date Available: 1-Aug-2019
DDC Class: 540 Chemie und zugeordnete Wissenschaften
Subject(s): photosensitive polymers
volume hologram formation
photo curing
diffraction
phase gratings
absorption gratings
License: https://creativecommons.org/licenses/by/4.0/
Journal Title: Polymers
Publisher: MDPI
Publisher Place: Basel
Volume: 9
Issue: 6
Article Number: 198
Publisher DOI: 10.3390/polym9060198
EISSN: 2073-4360
Appears in Collections:FG Nanostrukturierte Biomaterialien » Publications

Files in This Item:
File Description SizeFormat 
polymers-09-00198.pdf3.2 MBAdobe PDFView/Open


This item is licensed under a Creative Commons License Creative Commons