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Main Title: Spin-ARPES EUV Beamline for Ultrafast Materials Research and Development
Author(s): Nie, Zhonghui
Turcu, Ion Cristian Edmond
Li, Yao
Zhang, Xiaoqian
He, Liang
Tu, Jian
Ni, Zhiqiang
Xu, Huangfeng
Chen, Yequan
Ruan, Xuezhong
Frassetto, Fabio
Miotti, Paolo
Fabris, Nicola
Poletto, Luca
Wu, Jing
Lu, Qiangsheng
Liu, Chang
Kampen, Thorsten
Zhai, Ya
Liu, Wenqing
Cacho, Cephise
Wang, Xuefeng
Wang, Fengqiu
Shi, Yi
Zhang, Rong
Xu, Yongbing
Type: Article
Language Code: en
Abstract: A new femtosecond, Extreme Ultraviolet (EUV), Time Resolved Spin-Angle Resolved Photo-Emission Spectroscopy (TR-Spin-ARPES) beamline was developed for ultrafast materials research and development. This 50-fs laser-driven, table-top beamline is an integral part of the “Ultrafast Spintronic Materials Facility”, dedicated to engineering ultrafast materials. This facility provides a fast and in-situ analysis and development of new materials. The EUV source based on high harmonic generation process emits 2.3 × 1011 photons/second (2.3 × 108 photons/pulse) at H23 (35.7 eV) and its photon energy ranges from 10 eV to 75 eV, which enables surface sensitive studies of the electronic structure dynamics. The EUV monochromator provides the narrow bandwidth of the EUV beamline while preserving its pulse duration in an energy range of 10–100 eV. Ultrafast surface photovoltaic effect with ~650 fs rise-time was observed in p-GaAs (100) from time-resolved ARPES spectra. The data acquisition time could be reduced by over two orders of magnitude by scaling the laser driver from 1 KHz, 4W to MHz, KW average power.
Issue Date: 22-Jan-2019
Date Available: 23-Aug-2019
DDC Class: 530 Physik
Subject(s): high-order harmonic generation
ultrafast extreme violet
time-resolved ARPES
Journal Title: Applied Sciences
Publisher: MDPI
Publisher Place: Basel
Volume: 9
Issue: 3
Article Number: 370
Publisher DOI: 10.3390/app9030370
EISSN: 2076-3417
Appears in Collections:Inst. Festkörperphysik » Publications

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