Influence of stray fields on the switching-field distribution for bit-patterned media based on pre-patterned substrates

dc.contributor.authorPfau, Bastian
dc.contributor.authorGünther, Christian M.
dc.contributor.authorGuehrs, Erik
dc.contributor.authorHauet, Thomas
dc.contributor.authorHennen, T.
dc.contributor.authorEisebitt, Stefan
dc.contributor.authorHellwig, Olav
dc.date.accessioned2022-01-28T21:24:47Z
dc.date.available2022-01-28T21:24:47Z
dc.date.issued2014-09-20
dc.description.abstractUsing a direct imaging method, we experimentally investigate the reversal of magnetic islands in a bit-patterned media sample based on a pre-patterned substrate. Due to systematic variation of the island distances in the media, we are able to study the influence of the dipolar interaction on the switching-field distribution of the island ensemble. The experimental findings are explained by an analytical magnetostatic model that allows us to quantify the different components of the demagnetizing field in the system and to distinguish intrinsic and dipolar broadening of the switching-field distribution. Besides the well-known dipolar broadening due to stray fields from neighboring islands, we find strong influence from the magnetized trench material on the island switching.en
dc.identifier.eissn1077-3118
dc.identifier.issn0003-6951
dc.identifier.urihttps://depositonce.tu-berlin.de/handle/11303/16216
dc.identifier.urihttp://dx.doi.org/10.14279/depositonce-14991
dc.language.isoenen
dc.rights.urihttps://creativecommons.org/licenses/by/3.0/en
dc.subject.ddc530 Physikde
dc.subject.othersample handlingen
dc.subject.otherfunctions and functionalsen
dc.subject.otherchemical compoundsen
dc.subject.othermagnetic materialsen
dc.subject.otherelectrodynamicsen
dc.subject.otherthin film depositionen
dc.subject.otherferromagnetismen
dc.subject.otherelectromagnetismen
dc.subject.otherdata storage and retrievalen
dc.subject.otherholographyen
dc.titleInfluence of stray fields on the switching-field distribution for bit-patterned media based on pre-patterned substratesen
dc.typeArticleen
dc.type.versionpublishedVersionen
dcterms.bibliographicCitation.articlenumber132407en
dcterms.bibliographicCitation.doi10.1063/1.4896982en
dcterms.bibliographicCitation.issue13en
dcterms.bibliographicCitation.journaltitleApplied Physics Letters (APL)en
dcterms.bibliographicCitation.originalpublishernameAmerican Institute of Physics (AIP)en
dcterms.bibliographicCitation.originalpublisherplaceMelville, NYen
dcterms.bibliographicCitation.volume105en
tub.accessrights.dnbfreeen
tub.affiliationFak. 2 Mathematik und Naturwissenschaften::Inst. Optik und Atomare Physik::FG Röntgenoptik und Nanometer-Optikde
tub.affiliation.facultyFak. 2 Mathematik und Naturwissenschaftende
tub.affiliation.groupFG Röntgenoptik und Nanometer-Optikde
tub.affiliation.instituteInst. Optik und Atomare Physikde
tub.publisher.universityorinstitutionTechnische Universität Berlinen

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