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Far‐UVC‐ and UVB‐induced DNA damage depending on skin type

Busch, Loris; Kröger, Marius; Zamudio Díaz, Daniela F.; Schleusener, Johannes; Lohan, Silke B.; Ma, Jackie; Witzel, Christian; Keck, Cornelia M.; Meinke, Martina C.

Far‐UVC radiation sources of wavelengths 222 nm and 233 nm represent an interesting potential alternative for the antiseptic treatment of the skin due to their high skin compatibility. Nevertheless, no studies on far‐UVC‐induced DNA damage in different skin types have been published to date, which this study aims for. After irradiating the skin with far‐UVC of the wavelengths 222 and 233 nm as well as broadband UVB, the tissue was screened for cyclobutane pyrimidine dimer‐positive (CPD+) cells using immunohistochemistry. The epidermal DNA damage was lower in dark skin types than in fair skin types after irradiation at 233 nm. Contrary to this, irradiation at 222 nm caused no skin type‐dependent differences, which can be attributed to the decreased penetration depth of radiation. UVB showed the relatively strongest differences between light and dark skin types when using a suberythemal dose of 3 mJ/cm2. As melanin is known for its photoprotective effect, we evaluated the ratio of melanin content in the stratum basale and stratum granulosum in samples of different skin types using two‐photon excited fluorescence lifetime imaging (TPE‐FLIM) finding a higher ratio up to skin type IV–V. As far‐UVC is known to penetrate only into the upper layers of the viable skin, the aforementioned melanin ratio could explain the less pronounced differences between skin types after irradiation with far‐UVC compared to UVB.
Published in: Experimental Dermatology, 10.1111/exd.14902, Wiley