A general approach to obtain soft x-ray transparency for thin films grown on bulk substrates

dc.contributor.authorFohler, Manuel
dc.contributor.authorFrömmel, Stefanie
dc.contributor.authorSchneider, Michael
dc.contributor.authorPfau, Bastian
dc.contributor.authorGünther, Christian M.
dc.contributor.authorHennecke, Martin
dc.contributor.authorGuehrs, Erik
dc.contributor.authorShemilt, Laura
dc.contributor.authorMishra, Durgamadhab
dc.contributor.authorBerger, Dirk
dc.contributor.authorSelve, Sören
dc.contributor.authorMitin, Dmitriy
dc.contributor.authorAlbrecht, Manfred
dc.contributor.authorEisebitt, Stefan
dc.date.accessioned2020-05-18T15:49:27Z
dc.date.available2020-05-18T15:49:27Z
dc.date.issued2017-10-19
dc.descriptionThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Review of Scientific Instruments 88, 103701 (2017); https://doi.org/10.1063/1.5006522 and may be found at https://doi.org/10.1063/1.5006522.en
dc.description.abstractWe present a general approach to thin bulk samples to transparency for experiments in the soft x-ray and extreme ultraviolet spectral range. The method relies on mechanical grinding followed by focused-ion-beam milling. It results in a uniformly thin area of high surface quality, suitable for nanoscale imaging in transmission. In a proof-of-principle experiment, nanoscale magnetic bits on a commercial hard drive glass disk are imaged with a spatial resolution below 30 nm by soft x-ray spectro-holography. Furthermore, we demonstrate imaging of a lithographically patterned test object via absorption contrast. Our approach is suitable for both amorphous and crystalline substrates and has been tested for a variety of common epitaxy growth substrates. Lateral thinning areas in excess of 100 μm2 and a remaining substrate thickness as thin as 150 nm are easily achievable. Our approach allows preserving a previously grown thin film, and from nanofocus electron diffraction, we find no evidence for morphological changes induced by the process, in agreement with numerical simulations of the ion implantation depth distributon. We expect our method to be widely applicable and especially useful for nanoscale imaging of epitaxial thin films.en
dc.identifier.eissn1089-7623
dc.identifier.issn0034-6748
dc.identifier.urihttps://depositonce.tu-berlin.de/handle/11303/11139
dc.identifier.urihttp://dx.doi.org/10.14279/depositonce-10030
dc.language.isoenen
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subject.ddc530 Physikde
dc.subject.otherthin bulk samplesen
dc.subject.otherfocused ion beamen
dc.subject.otherultraviolet opticsen
dc.subject.otherthin filmsen
dc.subject.otherimagingen
dc.titleA general approach to obtain soft x-ray transparency for thin films grown on bulk substratesen
dc.typeArticleen
dc.type.versionpublishedVersionen
dcterms.bibliographicCitation.articlenumber103701en
dcterms.bibliographicCitation.doi10.1063/1.5006522en
dcterms.bibliographicCitation.issue10en
dcterms.bibliographicCitation.journaltitleReview of Scientific Instrumentsen
dcterms.bibliographicCitation.originalpublishernameAmerican Institute of Physics (AIP)en
dcterms.bibliographicCitation.originalpublisherplaceMelville, NYen
dcterms.bibliographicCitation.volume88en
tub.accessrights.dnbfreeen
tub.affiliationFak. 2 Mathematik und Naturwissenschaften::Inst. Optik und Atomare Physik::FG Röntgenoptik und Nanometer-Optikde
tub.affiliation.facultyFak. 2 Mathematik und Naturwissenschaftende
tub.affiliation.groupFG Röntgenoptik und Nanometer-Optikde
tub.affiliation.instituteInst. Optik und Atomare Physikde
tub.publisher.universityorinstitutionTechnische Universität Berlinen

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