Investigating the trimethylaluminium/water ALD process on mesoporous silica by in situ gravimetric monitoring
dc.contributor.author | Strempel, Verena E. | |
dc.contributor.author | Knemeyer, Kristian | |
dc.contributor.author | Naumann d’Alnoncourt, Raoul | |
dc.contributor.author | Rosowski, Frank | |
dc.date.accessioned | 2018-05-31T09:42:51Z | |
dc.date.available | 2018-05-31T09:42:51Z | |
dc.date.issued | 2018-05-24 | |
dc.description.abstract | A low amount of AlOx was successfully deposited on an unordered, mesoporous SiO2 powder using 1–3 ALD (Atomic Layer Deposition) cycles of trimethylaluminium and water. The process was realized in a self-built ALD setup featuring a microbalanceand a fixed particle bed. The reactor temperature was varied between 75, 120, and 200 °C. The self-limiting nature of the deposition was verified by in situ gravimetric monitoring for all temperatures. The coated material was further analyzed by nitrogen sorption, inductively coupled plasma-optical emission spectroscopy, powder X-ray diffraction, high-resolution transmission electron microscopy, attenuated total reflection Fourier transformed infrared spectroscopy, and elemental analysis. The obtained mass gains correspond to average growth between 0.81–1.10 Å/cycle depending on substrate temperature. In addition, the different mass gains during the half-cycles in combination with the analyzed aluminum content after one, two, and three cycles indicate a change in the preferred surface reaction of the trimethylaluminium molecule from a predominately two-ligand exchange with hydroxyl groups to more single-ligand exchange with increasing cycle number. Nitrogen sorption isotherms demonstrate (1) homogeneously coated mesopores, (2) a decrease in surface area, and (3) a reduction of the pore size. The experiment is successfully repeated in a scale-up using a ten times higher substrate batch size. | en |
dc.description.sponsorship | DFG, 325093850, Open Access Publizieren 2017 - 2018 / Technische Universität Berlin | de |
dc.identifier.issn | 2079-4991 | |
dc.identifier.uri | https://depositonce.tu-berlin.de/handle/11303/7889 | |
dc.identifier.uri | http://dx.doi.org/10.14279/depositonce-7050 | |
dc.language.iso | en | en |
dc.rights.uri | https://creativecommons.org/licenses/by/4.0/ | en |
dc.subject.ddc | 570 Biowissenschaften; Biologie | de |
dc.subject.ddc | 540 Chemie und zugeordnete Wissenschaften | de |
dc.subject.other | atomic layer deposition | en |
dc.subject.other | ALD | en |
dc.subject.other | in situ gravimetric | en |
dc.subject.other | mesoporous silica | en |
dc.subject.other | ligand exchange | en |
dc.subject.other | fixed bed | en |
dc.subject.other | particle coating | en |
dc.title | Investigating the trimethylaluminium/water ALD process on mesoporous silica by in situ gravimetric monitoring | en |
dc.type | Article | en |
dc.type.version | publishedVersion | en |
dcterms.bibliographicCitation.articlenumber | 365 | en |
dcterms.bibliographicCitation.doi | 10.3390/nano8060365 | en |
dcterms.bibliographicCitation.issue | 6 | en |
dcterms.bibliographicCitation.journaltitle | Nanomaterials | en |
dcterms.bibliographicCitation.originalpublishername | MDPI | en |
dcterms.bibliographicCitation.originalpublisherplace | Basel | en |
dcterms.bibliographicCitation.pageend | 14 | en |
dcterms.bibliographicCitation.pagestart | 1 | en |
dcterms.bibliographicCitation.volume | 8 | en |
tub.accessrights.dnb | free | en |
tub.affiliation | Verbundforschung::Exzellenzcluster (EXC)::BasCat Joint Lab | de |
tub.affiliation | Fak. 2 Mathematik und Naturwissenschaften::Inst. Chemie::FG Metallorganische Chemie und Anorganische Materialien | de |
tub.affiliation.faculty | Verbundforschung | de |
tub.affiliation.faculty | Fak. 2 Mathematik und Naturwissenschaften | de |
tub.affiliation.group | BasCat Joint Lab | de |
tub.affiliation.group | FG Metallorganische Chemie und Anorganische Materialien | de |
tub.affiliation.institute | Exzellenzcluster (EXC) | de |
tub.affiliation.institute | Inst. Chemie | de |
tub.publisher.universityorinstitution | Technische Universität Berlin | en |