Reduction of the transverse effective charge of optical phonons in ZnO under pressure

dc.contributor.authorReparaz, Juan Sebastián
dc.contributor.authorMuniz, Luis Antonio
dc.contributor.authorWagner, Markus R.
dc.contributor.authorGoñi, Alejandro R.
dc.contributor.authorAlonso, Maria Isabel
dc.contributor.authorHoffmann, Axel
dc.contributor.authorMeyer, Bruno K.
dc.date.accessioned2020-03-10T12:15:57Z
dc.date.available2020-03-10T12:15:57Z
dc.date.issued2010-06-09
dc.descriptionThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Appl. Phys. Lett. 96, 231906 (2010) and may be found at https://doi.org/10.1063/1.3447798."en
dc.description.abstractFrom Raman scattering on a-plane wurtzite ZnO crystals we obtained a decreasing splitting between longitudinal and transversal optical phonons with A1 and E1 symmetry as a function of hydrostatic pressure up to 5.5 GPa. Consequently, the transverse effective charge (e∗T) exhibits a strong reduction with increasing pressure, yielding 2.17–14.6×10−3 P/GPa and 2.04–13.7×10−3 P/GPa (in units of the elementary charge) for the A1 and E1 phonons, respectively. We find a clear systematic in the linear pressure coefficient of e∗T with bond polarity for the series of wide-band gap semiconductors SiC, AlN, GaN, and ZnO.en
dc.description.sponsorshipDFG, 43659573, SFB 787: Halbleiter - Nanophotonik: Materialien, Modelle, Bauelementeen
dc.identifier.eissn1077-3118
dc.identifier.issn0003-6951
dc.identifier.urihttps://depositonce.tu-berlin.de/handle/11303/10906
dc.identifier.urihttp://dx.doi.org/10.14279/depositonce-9799
dc.language.isoenen
dc.rights.urihttp://rightsstatements.org/vocab/InC/1.0/en
dc.subject.ddc530 Physikde
dc.subject.otherZnO crystalsen
dc.subject.othera-plane wurtzite ZnOen
dc.subject.othersemiconductoren
dc.subject.otherpressure dependenceen
dc.titleReduction of the transverse effective charge of optical phonons in ZnO under pressureen
dc.typeArticleen
dc.type.versionpublishedVersionen
dcterms.bibliographicCitation.articlenumber231906en
dcterms.bibliographicCitation.doi10.1063/1.3447798en
dcterms.bibliographicCitation.issue23en
dcterms.bibliographicCitation.journaltitleApplied Physics Lettersen
dcterms.bibliographicCitation.originalpublishernameAmerican Institute of Physics (AIP)en
dcterms.bibliographicCitation.originalpublisherplaceMelville, NYen
dcterms.bibliographicCitation.volume96en
tub.accessrights.dnbfreeen
tub.affiliationFak. 2 Mathematik und Naturwissenschaften::Inst. Festkörperphysik::FG Optische Charakterisierung von Halbleiternde
tub.affiliation.facultyFak. 2 Mathematik und Naturwissenschaftende
tub.affiliation.groupFG Optische Charakterisierung von Halbleiternde
tub.affiliation.instituteInst. Festkörperphysikde
tub.publisher.universityorinstitutionTechnische Universität Berlinen

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