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🆕 Date Issued:
2020-03-24
🗄 In DepositOnce:2020-05-28
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Thin-film flip-chip UVB LEDs realized by electrochemical etching

Bergmann, Michael A.; Enslin, Johannes; Hjort, Filip; Wernicke, Tim; Kneissl, Michael; Haglund, Åsa

We demonstrate a thin-film flip-chip (TFFC) light-emitting diode (LED) emitting in the ultraviolet B (UVB) at 311 nm, where substrate removal has been achieved by electrochemical etching of a sacrificial Al0.37Ga0.63N layer. The electroluminescence spectrum of the TFFC LED corresponds well to the as-grown LED structure, showing no sign of degradation of structural and optical properties by electrochemical etching. This is achieved by a proper epitaxial design of the sacrificial layer and the etch stop layers in relation to the LED structure and the electrochemical etch conditions. Enabling a TFFC UV LED is an important step toward improving the light extraction efficiency that limits the power conversion efficiency in AlGaN-based LEDs.
ultraviolet lightetchingelectroluminescenceepitaxylight emitting diodeselectrochemistryflip chipnitridesthin film devicessemiconductors
Published in: Applied Physics Letters, 10.1063/1.5143297, American Institute of Physics (AIP)
Creative Commons Attribution 4.0 (CC BY)Creative Commons Attribution 4.0 (CC BY)
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